A comprehensive nano-interpenetrating semiconducting photoresist toward all-photolithography organic electronics

Maskless photolithography: Embossed photoresist as its own optical element

This letter demonstrates that features embossed on the surface of a layer of photoresist can direct UV light in the photoresist layer. These topographical features act as optical elements: they focus/ disperse and phase shift incident light in the optical near field, inside the resist layer. A number of different surface topographies have been examined, which give 50–250 nm features after expos...

Inorganic polymer photoresist for direct ceramic patterning by photolithography.

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.

Photoresist functionalisation method for high-density protein microarrays using photolithography

Since the last decade, there is a growing need for patterned biomolecules for various applications ranging from diagnostic devices to enabling fundamental biological studies with high throughput. Protein arrays facilitate the study of protein–protein, protein–drug or protein–DNA interactions as well as highly multiplexed immunosensors based on antibody–antigen recognition. Protein microarrays a...

Molecular and Nano-electronics

Graphene Nano-Ribbon Electronics

We have fabricated graphene nano-ribbon field-effect transistor devices and investigated their electrical properties as a function of ribbon width. Our experiments show that the resistivity of a ribbon increases as its width decreases, indicating the impact of edge states. Analysis of temperature dependent measurements suggests a finite quantum confinement gap opening in narrow ribbons. The ele...